MgyNi1-y(H-x) thin films deposited by magnetron co-sputtering

A high homoepitaxial deposition rate has also been observed in the related study where the RF-magnetron sputtered ZnO films, deposited on the Zn-face of ZnO single crystals, were

Thus the observed relation between growth rates and countable increment deposition rate in capelin larvae (Fig. 4 and 5), is likely to be due to a real deposition of one increment

In this work, we present the measurement results of stress and hysteresis for the following metals deposited in the same sputtering equipment – Al, Ti, Al-Ti

Since these deposition processes were not included in the FOTOPLUME model calculations, dry deposition and precipitation scavenging en route from the emissions to

The objective was to evaluate particulate matter characteristics indoors with respect to outdoors, to estimate penetration of outdoor particles and deposition rates

approximation, the processes of dry and wet deposition of sulphur were described using constant deposition rates. The main difference between the wet deposition

In this work, we have studied structural and optical properties of the films deposited at different deposition pressures, discovering the possibility of engineering the optical band

Figure 1: A photograph of yttrium hydride films deposited on glass. Vertical lines visible on the samples visualize the reflection, whereas the horizontal lines on the